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Nanometer-sized pores (nanopores) in thin membranes can be used both as biomolecular sieve [1] and as nanosensor platform for rapid electrical detection and characterization of biomolecules [2]. The nanopores are typically produced by parallel processing at micron scale (based on silicon technology) combined with serial processing at nano scale based on electron beam (EBL) or focused ion beam (FIB) lithographies [3]. Serial nature and high cost of EBL or FIB processing are some of limiting factors for high scale fabrication of such nanofilters or nanosensors. Porenix has developed a technique for fabricating multiple or single nanopores in thin supported membranes based only on parallel processing – photolithography combined with colloidal lithography. While photolithography is well established technique in electronics and MEMS (micro electro-mechanical system) industries, application of colloidal lithography at industrial scale is not exploited yet. Porenix is pioneering in this area. By using the colloidal lithography, we achieve characteristic spacing between the adsorbed spherical nanoparticles. Consequently, when the pattern of nanoparticles is transferred into nanopores, the uniform spacing is preserved causing exceptionally high-quality filtering membranes (no overlap of neighboring pores). Porenix holds both know-how and patented IP for applying the colloidal lithography on wafer scale and utilizing it to produce ultra-thin nanoporous membranes. We have access to MC-2 Nanofabrication Laboratory within Chalmers University of Technology for low-scale production of the membranes. Nanopore fabrication:Step 1: Nanospheres adsorbed on the membrane support
Step 2: Corresponding nanopores induced in the membrane
Step 3: Windows spanned by the nanoporous membrane revealed by photolithography and anisotropic etching of the support
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